R.W. Gammon, E. Courtens, et al.
Physical Review B
The depth porosity profile of nanoporous poly(methylsilsesquioxane) thin films was investigated with neutron reflectivity using toluene-d8 or D2O as probes. The nanoporous films show a selective sorption behavior and swell when they are exposed to the selective solvent. The results show a localized higher porosity at the interface between porous films and silicon substrates, which suggests more careful control of the spatial pore distribution is needed to meet the thermo-mechanical stability requirements of porous low-k materials.
R.W. Gammon, E. Courtens, et al.
Physical Review B
John G. Long, Peter C. Searson, et al.
JES
J. Tersoff
Applied Surface Science
Heinz Schmid, Hans Biebuyck, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures