A 2.57mW 5.9-8.4GHz Cryogenic FinFET LNA for Qubit Readout
Jean-Olivier Plouchart, Dereje Yilma, et al.
RFIC 2022
This letter reports the statistical analysis of circuit-level FET high-speed performance in 65-nm silicon-on-insulator CMOS technology. Practical performance metrics are derived from full 300-mm wafer measurements. The proposed circuit-level layout wiring parasitics-aware FET reflects realistic FET that is placed in circuits. Its measurement and model are directly applicable to circuit design in conjunction with multiple layers of yield and manufacturability considerations. A stretched gate-pitch NFET design shows an average current gain cutoff frequency fT of 250 GHz, with 7.6% standard deviation, 6.7% mismatch standard deviation, and maximum fT of 307 GHz. The proposed characterization methodology will become more relevant to technologies beyond 65 nm. © 2007 IEEE.
Jean-Olivier Plouchart, Dereje Yilma, et al.
RFIC 2022
Jean-Olivier Plouchart, Daiek Kim, et al.
CSICS 2007
Daeik D. Kim, Ongyeun Cho, et al.
CSICS 2008
S. Sun, F. Wang, et al.
CICC 2013