About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Publication
DRC 1995
Conference paper
Low power 77 K nano-memory with single electron nano-crystal storage
Abstract
The experimental results of a threshold-shifting nano-memory are presented. The observations are consistent with single electron storage in nano-crystals and offer possible evidence of Coulomb blockage at 77 K. The nano-memory consists of a silicon field-effect transistor with nano-crystals of silicon placed in the gate oxide in close proximity of the inversion surface. Electron charge is stored in these isolated 5-10 nm size nano-crystals which are separated from each other by >5 nm of SiO2 and from the inversion layer on the substrate surface by sub-2 nm of SiO2. Charge is injected from the inversion layer and its storage in the nano-crystals causes a shift in the threshold voltage which is sensed via current. The magnitude of this threshold shift is relatable to the charge in the nano-crystals, oxide thicknesses, and other device parameters.