A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
The pulsed laser deposition technique has been used to deposit, in a layer-by-layer growth mode, superconducting cuprate thin films on (100) SrTiO3 substrates. The films are deposited using a combination of pulsed O2 jet and a continuous source of atomic O, with the average background pressure maintained as low as 1 mTorr. This permits the in-situ monitoring of the growth process using reflection high-energy electron diffraction (RHEED). Before growth of the cuprate films, a thin SrTiO3 buffer layer is homoepitaxially deposited on the substrate to provide an atomically smooth surface. On a smooth surface, the growth of SrTiO3 occurs in a layer-by-layer mode as indicated by the intensity oscillations of the specular spot in the RHEED pattern. Subsequent layer-by-layer growth of a variety of cuprate films, including YBa2Cu3O7-δ (YBCO), La1.85Sr0.15CuO4 (LSCO), Nd1.85Ce0.15CuO4 (NCCO), and SrCuO2 (SCO), has been achieved under appropriate deposition conditions. © 1993.
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
Douglass S. Kalika, David W. Giles, et al.
Journal of Rheology
S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999
T.N. Morgan
Semiconductor Science and Technology