Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
This paper details the impact of partial element accuracy on quasi-static partial element equivalent circuit (PEEC) model stability in the time domain. The potential sources of inaccurate partial element values are found to be poor geometrical meshing and the use of unsuitable partial element calculation routines. The impact on PEEC model stability of erroneous partial element values, and the coefficients of potential and partial inductances, are shown as theoretical constraints and practical results. Projection meshing, which is a discretization strategy suitable for the PEEC method, is shown to improve calculated partial element values for the same number of unknowns, thus improving model stability. © 2006 IEEE.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Ronald Troutman
Synthetic Metals
A. Gangulee, F.M. D'Heurle
Thin Solid Films
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010