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SPIE Advanced Lithography 2010
A new method for precise computations on hot electrons in semiconductors is introduced. It combines attributes of Monte Carlo and distribution-function-based methods. Exploratory calculations, with a model semiconductor, are reported, including time dependence of drift velocity, steady-state longitudinal diffusivity and avalanche rate. © 1971.
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
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