Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We examine the effect of Co-cluster morphology on giant magnetoresistance (MR) in phase-separated Co-Cu films. The Co clusters were characterized through grazing incidence, anomalous, small-angle x-ray scattering. With thermal annealing the Co cluster diameter increases from 21 to ∼250 with a concomitant drop from ∼35% to 1% in the 4.2 K MR. The MR scales approximately as the inverse cluster size. Comparison with theory indicates that interfacial spin-dependent electron scattering is the dominant scattering mechanism underlying giant MR for cluster diameters up to at least 250. © 1993 The American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
I. Morgenstern, K.A. Müller, et al.
Physica B: Physics of Condensed Matter
Thomas H. Baum, Carl E. Larson, et al.
Journal of Organometallic Chemistry
O.F. Schirmer, W. Berlinger, et al.
Solid State Communications