Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
This note continues work by the Lehmers [3], Gunderson [2], Granville and Monagan [1], and Tanner and Wagstaff [6], producing lower bounds for the prime exponent p in any counterexample to the first case of Fermat’s Last Theorem. We improve the estimate of the number of residues r mod p2such that rP= r mod p2and thereby improve the lower bound on p to 7.568 x 1017. © 1990 American Mathematical Society.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Fausto Bernardini, Holly Rushmeier
Proceedings of SPIE - The International Society for Optical Engineering
F. Odeh, I. Tadjbakhsh
Archive for Rational Mechanics and Analysis
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BMC Bioinformatics