Conference paperPerformance data on new tunable attenuating PSM for 193nm and 157nm lithographyHans Becker, Frank Schmidt, et al.Photomask and Next-Generation Lithography Mask Technology 2004
Workshop paperA framework for extensible collaborative asset-based service engagementFan Jing Meng, Ying Huang, et al.ICEBE 2007
PaperOn convex relaxations of quadrilinear termsSonia Cafieri, Jon Lee, et al.Journal of Global Optimization
