Conference paper
True 3-D displays for avionics and mission crewstations
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997
Ion beam etching and deposition are normally carried out with beam, target and substrate potentials near ground potential. In this paper, the effects of intentional or unintentional changes in these potentials are described. Examples include beam neutralization, a single extraction grid, substrate bias, and target bias. Each example is described in terms of beam plasma parameters. © 1982.
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997
Lawrence Suchow, Norman R. Stemple
JES
Hiroshi Ito, Reinhold Schwalm
JES
Ronald Troutman
Synthetic Metals