Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Combinatorial methodologies offer potential for rapid research of photoresist materials and formulations

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A combinatorial research methodology was presented for investigating material factors in photoresist formulation more rapidly with respect to traditional experimental design. The major advantage of combinatorial methodology is its ability to generate data over a wide range of system variables simultaneously. It is shown that the combinatorial technique generates both temperature and time gradients in polymer films.