Publications

9 results at SPIE Advanced Lithography + Patterning 2026

Mitigating X‑ray–Induced Damage in CD‑SAXS Metrology of EUV Resists
- - Philipp Wieser
  - Kevin Yager
  - et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
IBM Lithography Roadmap: Need for Future Lithography Tools and Masks and Requirements for Resists to Avoid Stochastic Defects
- - Allen Gabor
  - Martin Burkhardt
  - et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
In-line XPS metrology for area selective deposition processes on patterned structures
- - Manasa Medikonda
  - Linda Wangoh
  - et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Scaling Single Expose EUV Gate LER Through Source-Resist-Mask Co-optimization
- - Gopal Kenath
  - Martin Burkhardt
  - et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Lithographic Process Optimization for Next-Generation Advanced Packaging Influenced by Wafer Topography and Reticle Stitching
- - Chris Bottoms
  - Sarah Nahar Chowdhury
  - et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Metal-Oxide Resist Develop Method Down-Select and Process Optimization
- - Nicholas Latham
  - Belle Antonovich
  - et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Measuring Contact Hole Distributions for Use in Predicting Missing Contact Hole Rates
- - Elisa Novelli
  - Chris A. Mack
  - et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Evaluation of High NA EUV for Subtractive Interconnect Patterning in Advanced Nodes
- - Chris Penny
  - Joe Lee
  - et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Exploring the Limits of Contact Hole Patterning with High NA EUV Lithography
- - Dario Goldfarb
  - Zheng Chen
  - et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026