Massive E-beam Metrology Characterization of Reticle Stitching Boundaries
- Genevieve Kane
- Connor Smith
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Chris Bottoms
Title
Research Lithography Process Engineer
Publications
Multi-reticle stitching: Applications from packaging to High-NA EUV
- Chris Bottoms
- Rick Johnson
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Large Feature Wafer Level In-Line Optical Metrology Techniques for Advanced Packaging Schemes
- Katherine Sieg
- Chris Bottoms
- et al.
- 2024
- SPIE Advanced Lithography + Patterning 2024
Top collaborators
JR
Jed Rankin
Photomask Supply and Development Strategy