Massive E-beam Metrology Characterization of Reticle Stitching BoundariesGenevieve KaneConnor Smithet al.2025SPIE Advanced Lithography + Patterning 2025
Multi-reticle stitching: Applications from packaging to High-NA EUVChris BottomsRick Johnsonet al.2025SPIE Advanced Lithography + Patterning 2025
Large Feature Wafer Level In-Line Optical Metrology Techniques for Advanced Packaging SchemesKatherine SiegChris Bottomset al.2024SPIE Advanced Lithography + Patterning 2024