Preoxidation Si cleaning and its impact on metal oxide semiconductor characteristics
- S.R. Kasi
- M. Liehr
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Publications
14327 results for Physical Sciences
Study particle emission in vacuum from film deposits
- Joseph S. Logan
- James J. McGill
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Moisture-induced interfacial oxidation of chromium on polyimide
- B.K. Furman
- H.M. Clearfield
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Preparation of low resistivity Cu-1 at. %Cr thin films by magnetron sputtering
- C. Cabral
- J.M.E. Harper
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surface analysis studies of copper chemical vapor deposition from 1,5-cyclooctadiene-copper(l)-hexafluoroacetylacetonate
- Susan L. Cohen
- Michael Liehr
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Dopant diffusion in silicides: Effect of diffusion paths
- Carol Stanis
- J.M. Cotte
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Nucleation and growth of ultrathin Fe and Au films on Cu(100) studied by scanning tunneling microscopy
- D.D. Chambliss
- R.J. Wilson
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Electron-sheath interaction in capacitive radio-frequency plasmas
- D. Vender
- R.W. Boswell
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Nucleation and growth of silicon on Si02 during SiH4 low pressure chemical vapor deposition as studied by hydrogen desorption titration
- M. Liehr
- S.S. Dana
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Temperature optimization in an azimuthally symmetric single-wafer chemical vapor deposition reactor: The low pressure regime
- David E. Kotecki
- Steven G. Barbee
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films