An electron microscope investigation of the effect of phosphorous doping on the plasma etching of polycrystalline silicon
- E.A. Irene
- E. Tierney
- et al.
- 2019
- JES
Paper
Publications
509 results at JES
II. Oxidation of Al Films
- Jean Grimblot
- Jerome M. Eldridge
- 2019
- JES
PaperProperties of AI2O3 Films Deposited from the AICI3, CO2, and H2 System
- V.J. Silvestri
- C.M. Osburn
- et al.
- 2019
- JES
PaperOne-Micron Polycide (WSI2 on Poly-Si) MOSFET Technology
- M.Y. Tsai
- H.H. Chao
- et al.
- 2019
- JES
PaperSilicon Oxidation Studies: Some Aspects of the Initial Oxidation Regime
- E.A. Irene
- 2019
- JES
PaperPlasma Oxide FET Devices
- A. Ray
- A. Reisman
- 2019
- JES
PaperFabrication Processes for a Silicon Substrate Package for Integrated Gallium Arsenide Laser Arrays
- Michael J. Brady
- 2019
- JES
PaperThe Defect Structure of ZnSe:Ga
- A. Ray
- F.A. Kröger
- 2019
- JES
PaperThe Defect Structure of Pure and Doped ZnSe
- A. Ray
- F.A. Kröger
- 2019
- JES
PaperPreparation and Some Properties of Chemically Vapor-Deposited Si-Rich SiO and Si3N4 Films
- D.W. Dong
- E.A. Irene
- et al.
- 2019
- JES
Paper