Implanted noble gas atoms as diffusion markers in silicide formationW.K. ChuS.S. Lauet al.1975Thin Solid Films
Molecular dynamics calculation of the isotope effect for vacancy diffusionCharles H. Bennett1975Thin Solid Films
Electrotransport in copper alloy films and the defect mechanism in grain boundary diffusionF.M. D'HeurleA. Gangulee1975Thin Solid Films
Mass transport during electromigration in aluminum-magnesium thin filmsA. GanguleeF.M. d'Heurle1975Thin Solid Films
Diffusion of arsenic along dislocations in epitaxial silicon filmsDavid R. CampbellK.N. Tuet al.1975Thin Solid Films
Some features of the behavior of misfit dislocations during diffusionJ.W. Matthews1975Thin Solid Films
Effect of a solute addition (Ta) on low temperature self-diffusion processes in goldD. GuptaR. Rosenberg1975Thin Solid Films