Detection of printable EUV mask absorber defects and defect adders by full chip optical inspection of EUV patterned wafers
- Luciana Meli
- Scott D. Halle
- et al.
- 2016
- ASMC 2016
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21 results for Ravi Bonam
EUV photomask defects: What prints, what doesn't, and what is required for HVM
- Jed Rankin
- Zhengqing John Qi
- et al.
- 2015
- SPIE Photomask Technology + EUV Lithography 2015
Toward defect guard-banding of EUV exposures by full chip optical wafer inspection of EUV mask defect adders
- Scott D. Halle
- Luciana Meli
- et al.
- 2015
- SPIE Advanced Lithography 2015
E-beam inspection of EUV mask defects: To etch or not to etch?
- Ravi Bonam
- Hung-Yu Tien
- et al.
- 2014
- SPIE Advanced Lithography 2014
E-beam inspection of EUV programmed defect wafers for printability analysis
- Ravi Bonam
- Scott Halle
- et al.
- 2013
- ASMC 2013
Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch
- Jennifer Church
- Luciana Meli
- et al.
- 2020
- J. Micro/Nanolithogr. MEMS MOEMS
Deep learning-based detection, classification, and localization of defects in semiconductor processes
- Dhruv V. Patel
- Ravi Bonam
- et al.
- 2020
- J. Micro/Nanolithogr. MEMS MOEMS
Detection of Printable EUV Mask Absorber Defects and Defect Adders by Full Chip Optical Inspection of EUV Patterned Wafers
- Luciana Meli
- Ravi Bonam
- et al.
- 2017
- IEEE Trans Semicond Manuf
Large area three dimensional structure fabrication using multilayer electron beam lithography
- Ravi Bonam
- John G. Hartley
- 2016
- JVSTB
Materials characterization for multilayer electron beam lithography
- Ravi Bonam
- John G. Hartley
- 2016
- JVSTB