About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Publication
JVSTB
Paper
Large area three dimensional structure fabrication using multilayer electron beam lithography
Abstract
Three dimensional nanostructures are of great interest in photonics and optical sensor communities. Although there are many theoretical models developed, lithographic reduction to practice is an ongoing challenge. Numerous lithographic techniques have been proposed for fabricating three dimensional structures with applications in photonics. We demonstrate a novel three-dimensional electron beam fabrication method that is precise, fast, intrinsically self-aligned and has the ability to produce large area patterns.