Publications

9 results for Robert N. Lang

Graded spin-on organic bottom antireflective coating for high NA lithography
- - Dario L. Goldfarb
  - Sean D. Burns
  - et al.
- 2008
- SPIE Advanced Lithography 2008
Current Developments of a High Performance CA Resist for Mask Making Application
- - Wu-Song Huang
  - Wei He
  - et al.
- 2003
- Photomask and Next-Generation Lithography Mask Technology 2003
Impact of thin resist processes on post-etch LER
- - Arpan P. Mahorowala
  - Dario L. Goldfarb
  - et al.
- 2003
- Microlithography 2003
Highly etch selective spin-on bottom antireflective coating for use in 193 nm lithography and beyond
- - Dirk Pfeiffer
  - Arpan Mahorowala
  - et al.
- 2003
- Microlithography 2003
Enhancement of KRS-XE for 50 keV advanced mask making applications
- - Karen Petrillo
  - David Medeiros
  - et al.
- 2002
- SPIE Photomask Technology 2002
Application of blends and side chain Si-O copolymers as high etch resistant sub 100 nm E-beam resists
- - Wu-Song Huang
  - Ranee Kwong
  - et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
A high performance E-beam resist coupling excellent dry etch resistance and sub 100nm resolution for advanced mask making
- - Wu-Song Huang
  - Ranee Kwong
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
A high performance E-beam resist coupling excellent dry etch resistance and sub 100nm resolution for advanced mask and device making
- - Wu-Song Huang
  - Ranee Kwong
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Extending the performance of KRS-XE for high throughput electron beam lithography for advanced mask making
- - David R. Medeiros
  - Karen E. Petrillo
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering