Role of chamber dimension in fluorocarbon based deposition and etching of Si O2 and its effects on gas and surface-phase chemistry
- E. Joseph
- B.-S. Zhou
- et al.
- 2008
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.