Publications

14 results for R. Ferguson

A high performance 90 nm SOI technology with 0.992 μm² 6T-SRAM cell
- - Mukesh Khare
  - S. Ku
  - et al.
- 2002
- IEDM 2002
When is bilayer thin-film imaging suitable: Comparison with single layer resists
- - Scott Halle
  - Alan Thomas
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
The mask error factor in optical lithography
- - Alfred K. Wong
  - Richard A. Ferguson
  - et al.
- 2000
- IEEE Trans Semicond Manuf
Level-specific lithography optimization for 1-Gb DRAM
- - Alfred K. Wong
  - Richard Ferguson
  - et al.
- 2000
- IEEE Trans Semicond Manuf
0.18 μm high-performance logic technology
- - S.W. Crowder
  - S. Greco
  - et al.
- 1999
- VLSI Technology 1999
Approach to pattern aspect ratio control
- - A. Thomas
  - Franz Zach
  - et al.
- 1999
- SPIE Advanced Lithography 1999
Lithographic effects of mask critical dimension error
- - Alfred K. K. Wong
  - Richard A. Ferguson
  - et al.
- 1998
- SPIE Advanced Lithography 1998
Lithographic evaluation of a DUV carbon attenuated phase shift mask
- - A.C. Callegan
  - K. Babich
  - et al.
- 1998
- Microelectronic Engineering
Electrical characterization of across-field lithographic performance for 256m bit dram technologies
- - Junichiro Iba
  - Kohji Hashimoto
  - et al.
- 1995
- SPIE Photomask Japan 1995
Optimization of resolution-enhanced photolithography for a 256Mb DRAM cell
- - R. Ferguson
  - Christopher P. Ausschnitt
  - et al.
- 1994
- VLSI Technology 1994