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Publication
VLSI Technology 1994
Conference paper
Optimization of resolution-enhanced photolithography for a 256Mb DRAM cell
Abstract
Demonstrated here is an approach for design-specific lithography optimization using simulation and experimental validation for a 256 Mb DRAM cell. Results from this study indicate that the optimum lithographic solution has a strong dependence on pattern shape and density. The performance enhancements were evaluated experimentally and compared with simulation.