Publications

19 results for M. Steen

pFET V _t control with HfO ₂/TiN/poly-Si gate stack using a lateral oxygenation process
- - B. Cartier
  - M. Steen
  - et al.
- 2009
- VLSI Technology 2009
High-performance high-κ/metal gates for 45nm CMOS and beyond with gate-first processing
- - M. Chudzik
  - B. Doris
  - et al.
- 2007
- VLSI Technology 2007
Band-edge high-performance high-κ /metal gate n-MOSFETs using cap layers containing group IIA and IIIB elements with gate-first processing for 45 nm and beyond
- - V. Narayanan
  - V.K. Paruchuri
  - et al.
- 2006
- VLSI Technology 2006
Poly-Si/AlN/HfSiO stack for ideal threshold voltage and mobility in sub-100 nm MOSFETs
- - K.-L. Lee
  - M.M. Frank
  - et al.
- 2006
- VLSI Technology 2006
Process optimization for high electron mobility in nMOSFETs with aggressively scaled HfO₂/metal stacks
- - V. Narayanan
  - K. Maitra
  - et al.
- 2006
- IEEE Electron Device Letters
Role of oxygen vacancies in V_FB/V_t stability of pFET metals on HfO₂
- - E. Cartier
  - F.R. McFeely
  - et al.
- 2005
- VLSI Technology 2005
Optimization of high κ gate stacks with poly-Si, FUSI and metal electrodes
- - R. Jammy
  - V. Narayanan
  - et al.
- 2005
- ISTC 2005
High performance FDSOI CMOS technology with metal gate and high-k
- - Bruce Doris
  - Y.-H. Kim
  - et al.
- 2005
- VLSI Technology 2005
Poly-Si/high-k gate stacks with near-ideal threshold voltage and mobility
- - M.M. Frank
  - V.K. Paruchuri
  - et al.
- 2005
- VLSI-TSA 2005
Effect of plasma interactions with low-κ films as a function of porosity, plasma chemistry, and temperature
- - Marcus A. Worsley
  - Stacey F. Bent
  - et al.
- 2005
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures