Magnetic tunnel junctions with AlN and AlNxOy barriers
- M.M. Schwickert
- J.R. Childress
- et al.
- 2001
- Journal of Applied Physics
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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35 results for Jeffrey R. Childress
IrMn spin-valves for high density recording
- J.R. Childress
- M.J. Carey
- et al.
- 2001
- IEEE Transactions on Magnetics
Corrosion-free dry etch patterning of magnetic random access memory stacks: Effects of ultraviolet illumination
- H. Cho
- K.-P. Lee
- et al.
- 2000
- Journal of Applied Physics
Cl2-based inductively coupled plasma etching of CoFeB, CoSm, CoZr and FeMn
- K.B. Jung
- H. Cho
- et al.
- 1999
- Materials Science and Engineering B: Solid-State Materials for Advanced Technology
Inductively coupled plasma etching of CoFeB, CoZr, CoSm and FeMn thin films in interhalogen mixtures
- H. Cho
- K.B. Jung
- et al.
- 1999
- Materials Science and Engineering B: Solid-State Materials for Advanced Technology
Plasma etching of NiFe/Cu and NiMnSb/Al2O3 multilayers for sub-micron pattern definition
- K.B. Jung
- J. Hong
- et al.
- 1999
- Journal of Magnetism and Magnetic Materials
Parametric study of NiFe and NiFeCo high density plasma etching using CO/NH3
- K.B. Jung
- J. Hong
- et al.
- 1999
- JES
Comparison of Cl2/He, Cl2/Ar, and Cl2/Xe plasma chemistries for dry etching of NiFe and NiFeCo
- K.B. Jung
- H. Cho
- et al.
- 1999
- JES
Interhalogen Plasma Chemistries for the Etching of NiMnSb
- H. Cho
- K.B. Jung
- et al.
- 1999
- Electrochemical and Solid-State Letters
Patterning of NiFe and NiFeCo in CO/NH3 high density plasmas
- K.B. Jung
- J. Hong
- et al.
- 1999
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films