Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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6 results for Gary Dabbagh

Process characterization of pitch-split resist materials for application at 16nm node
- - Steven J. Holmes
  - Cherry Tang
  - et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Building an immersion top coat from the ground up - Materials perspective
- - Mahmoud Khojasteh
  - Irene Popova
  - et al.
- 2007
- SPIE Advanced Lithography 2007
High performance 193nm photoresists based on fluorosulfonamide
- - Wenjie Li
  - Kuang-Jung Chen
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Progress towards developing high performance immersion compatible materials and processes
- - Karen Petrillo
  - Kaushal Patel
  - et al.
- 2005
- Microlithography 2005
193nm single layer photoresists: Defeating tradeoffs with a new class of fluoropolymers
- - P.R. Varanasi
  - R.W. Kwong
  - et al.
- 2005
- Microlithography 2005
Fluoroalcohol-methacrylate resists for 193nm lithography
- - P.R. Varanasi
  - R.W. Kwong
  - et al.
- 2005
- J. Photopolym. Sci. Tech.