Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We present a new rational algorithm for solving Risch differential equations in towers oftranscendental elementary extensions. In contrast to a recent algorithm of Davenport we do not require a progressive reduction of the denominators involved, but use weak normality to obtain a formula for the denominator of a possible solution. Implementation timings show this approach to be faster than a Hermite-like reduction. © 1990, Academic Press Limited. All rights reserved.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Shu Tezuka
WSC 1991
Paul J. Steinhardt, P. Chaudhari
Journal of Computational Physics
J. LaRue, C. Ting
Proceedings of SPIE 1989