Structure of low dielectric constant to extreme low dielectric constant SiCOH films: Fourier transform infrared spectroscopy characterization

Abstract

The SiCOH dielectric films were prepared using PECVD. The films were analyzed by determining their elemental composition and by FTIR with deconvolution of the absorption peaks. The analysis shows that the PECVD of tetramethylcyclotetrasiloxane (TMCTS) produces a highly crosslinked networked SiCOH film. The films deposited from mixtures of TMCTS and organic precursor incorporate hydrocarbon fragments into the films.