Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We study the composition of random permutations drawn from a small family of O(n3) simple permutations on (0, 1)n. Specifically, we ask how many randomly selected simple permutations need be composed to yield a permutation that is close to k-wise independent. We improve on the results of Cowers (Combin Probab Comput 5 (1996) 119-130) and Hoory et al. (Presented at 31st ICALP 2004) and show that it suffices to compose min(O(n3k 2), Õ(n2k2)) random permutations from this family for any n ≥ 3 and k ≤ 2n - 2. The Õ notation suppresses a poly logarithmic factor in k and n. © 2007 Wiley Periodicals, Inc.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Robert F. Gordon, Edward A. MacNair, et al.
WSC 1985
Kenneth L. Clarkson, K. Georg Hampel, et al.
VTC Spring 2007
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010