SPIE Advanced Lithography 2006
Conference paper

Silicon IP reuse standards for design for manufacturability

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Design for Manufacturability (DFM) has become a major semiconductor topic that spans various issues, including issues related to lithography hardware limitations, and issues related to variability. There is, however, an issue that crosses multiple DFM domains: the need to reuse designed Silicon IP blocks or "cores" across various manufacturing processes. Unfortunately, there are no standards to facilitate the reuse of circuit blocks while addressing the lithography- and variability-related issues. Specifically, there is no clear definition for a user of a core to evaluate "manufacturability" of a core for a set of foundry processes. We present a quantitative DFM standard for Silicon IP reuse, which addresses this problem. This work was done in conjunction with VSIA's DFM team.