Publication
VLSI Technology 2015
Conference paper

Si nanowire CMOS fabricated with minimal deviation from RMG FinFET technology showing record performance

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Abstract

We demonstrate a process flow for creating gate-all-around (GAA) Si nanowire (SiNW) MOSFETs with minimal deviation from conventional replacement metal gate (RMG) finFET technology as used in high-volume manufacturing. Using this technique, we demonstrate the highest DC performance shown for GAA SiNW MOSFETs at sub-100 nm gate pitch, and functional high-speed ring oscillators.

Date

25 Aug 2015

Publication

VLSI Technology 2015

Authors

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