Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We consider the problem of determining when a given source can be used to approximate the output due to any input to a given channel. We provide achievability and converse results for a general source and channel. For the special case of a full-rank discrete memoryless channel we give a stronger converse result than we can give for a general channel.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Xiaozhu Kang, Hui Zhang, et al.
ICWS 2008
Liqun Chen, Matthias Enzmann, et al.
FC 2005
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007