Publication
Physical Review B
Paper

Optical absorption in amorphous Si films at high pressure

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Abstract

We report the pressure-dependent optical absorption in the fundamental edge region of amorphous silicon prepared by sputtering and glow discharge methods. For pressures up to 20 kbar we find a negative pressure coefficient of about 1 × 10-6 eV/bar for the isoabsorption energies. In a higher range of pressure, starting with pressures of about 50 kbar, we observed irreversible red shifts in the absorption curves. © 1977 The American Physical Society.

Date

15 Oct 1977

Publication

Physical Review B

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