Conference paper
Compression for data archiving and backup revisited
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
We report the pressure-dependent optical absorption in the fundamental edge region of amorphous silicon prepared by sputtering and glow discharge methods. For pressures up to 20 kbar we find a negative pressure coefficient of about 1 × 10-6 eV/bar for the isoabsorption energies. In a higher range of pressure, starting with pressures of about 50 kbar, we observed irreversible red shifts in the absorption curves. © 1977 The American Physical Society.
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics
C.M. Brown, L. Cristofolini, et al.
Chemistry of Materials
A.B. McLean, R.H. Williams
Journal of Physics C: Solid State Physics