Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.
A grain-boundary-dislocation mechanism for diffusion-induced boundary migration is proposed. It is suggested that point-defect emission from grain-boundary dislocations is necessary for the solution and transport of substitutional solutes. Grain-boundary migration occurs as a by-product of the emission of point defects, owing to the requirement that the dislocation remain in the grain-boundary plane. © 1981 Taylor & Francis Group, LLC.
Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.
E. Burstein
Ferroelectrics
M.A. Lutz, R.M. Feenstra, et al.
Surface Science
J. Tersoff
Applied Surface Science