Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
This paper describes a comprehensive set of technologies that enables rich interaction paradigms for Web applications. These technologies improve the richness of user interfaces and the responsiveness of user interactions. Furthermore, they support disconnected or weakly connected modes of operation. The technologies can be used in conjunction with many Web browsers and client platforms, interacting with a J2EE™ server. The approach is based on projecting the server-side model-view-controller paradigm onto the client. This approach is firmly rooted in the Web paradigm and proposes a series of incremental extensions. Most of the described technologies have been adopted by IBM server (WebSphere£) and client products. © 2004 by International Business Machines Corporation.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Eric Price, David P. Woodruff
FOCS 2011
Heinz Koeppl, Marc Hafner, et al.
BMC Bioinformatics
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Theoretical Computer Science