Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
For Markov chains of M/G/1 type that are not skip-free to the left, the corresponding G matrix is shown to have special structure and be determined by its first block row. An algorithm that takes advantage of this structure is developed for computing G. For non-skip-free M/G/1 type Markov chains, the algorithm significantly reduces the computational complexity of calculating the G matrix, when compared with reblocking to a system that is skip-free to the left and then applying usual iteration schemes to find G. A similar algorithm to calculate the R matrix for G/M/1 type Markov chains that are not skip-free to the right is also described.
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Timothy J. Wiltshire, Joseph P. Kirk, et al.
SPIE Advanced Lithography 1998