Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
This paper presents an enhanced process model in an optimistic distributed simulation to develop a method for tracking causality and safe-time and its application in the design of a local fossil identification technique. The fossil identification process is reduced to a local operation that operates without requiring a GVT estimation method. The information needed for fossil identification is captured during normal event processing from the enhanced process model. This technique assumes FIFO communication channels and simulation model with static communication topology. A proof of correctness of the fossil identification technique using this enhanced process model is presented. Copyright © 2009, Inderscience Publishers.
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991
Naga Ayachitula, Melissa Buco, et al.
SCC 2007
T. Graham, A. Afzali, et al.
Microlithography 2000