Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
A proposed theory of liquid electrophotographic development explicitly accounts for the presence of excess ions. The theory shows that the maximum development possible is decreased from the neutralization limit by the ratio of the toner conductivity to the total conductivity. Three independent techniques are proposed to determine this ratio. It is found to be about 0.2 for a commercially available liquid developer.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
Chi-Leung Wong, Zehra Sura, et al.
I-SPAN 2002
Raymond Wu, Jie Lu
ITA Conference 2007