Invited: The potential of Electron Beam Technology for Microfabrication

Abstract

Applications of scanning electron beam lithographic systems to the fabrication of LSI circuits have been discussed. A brief description of the key components of such systems is given, together with comments on the different options available in these components. As an example of the evaluation of electron beam systems, the performance of V.S.I.1)an automated vector scan electron beam system has been discussed. In particular, the through-put and examples of experimental devices fabricated by the system are presented. © 1977 The Japan Society of Applied Physics.