Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The inelastic Coulomb scattering rate in-1 of extended electrons by localized ones is considered and shown to be proportional to T2(lnT)d+1, where d is the dimensionality. This nonlinear dependence appears surprisingly linear over significant temperature regions, and its magnitude is large enough to account for in of, e.g. (normal- and super-)conducting oxides. © 1990 The American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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Langmuir
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