Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Stochastic multi-stage linear programs are rarely used in practical applications due to their size and complexity. Using a general matrix to aggregate the constraints of the deterministic equivalent yields a lower bound. A similar aggregation in the dual space provides an upper bound on the optimal value of the given stochastic program. Jensen's inequality and other approximations based on aggregation are a special case of the suggested approach. The lower and upper bounds are tightened by updating the aggregating weights.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
A.R. Conn, Nick Gould, et al.
Mathematics of Computation
John A. Hoffnagle, William D. Hinsberg, et al.
Microlithography 2003
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering