About cookies on this site Our websites require some cookies to function properly (required). In addition, other cookies may be used with your consent to analyze site usage, improve the user experience and for advertising. For more information, please review your options. By visiting our website, you agree to our processing of information as described in IBM’sprivacy statement. To provide a smooth navigation, your cookie preferences will be shared across the IBM web domains listed here.
Publication
SPIE OPTO 2014
Conference paper
High-efficiency heterojunction solar cells on crystalline germanium substrates
Abstract
Stand-alone heterojunction (HJ) solar cells demonstrated on crystalline germanium (c-Ge) substrates are proposed for usage as the bottom cells of tandem-junction solar cells in various thin-film solar cell technologies. The emitter of the HJ solar cells is formed by growing thin layers of highly doped hydrogenated microcrystalline silicon (μc-Si:H) and further passivated by growing thin layers of hydrogenated amorphous silicon (a-Si:H). The μc-Si:H and a-Si:H layers are grown in the same reactor using plasma-enhanced chemical vapor deposition (PECVD) at temperatures close to 200°C. The quality of the c-Ge surface passivation by μc-Si:H and a-Si:H has a direct impact on the electrical performance of the HJ solar cells. Conversion efficiencies of 5.9% and 7.2% have been achieved for stand-alone c-Ge solar cells on n-type and p-type c-Ge substrates, respectively. These conversion efficiencies are well-comparable with the conversion efficiencies reported for conventional homojunction solar cells fabricated at temperatures as high as 600°C. © 2014 SPIE.