International Journal of Mass Spectrometry and Ion Processes

Electron attachment chemistry of SiCl4. Relevance to plasma reactions

View publication


The anions formed by electron impact upon silicon tetrachloride in the 10-6 torr range have been identified and their relative concentrations have been measured as a function of electron energy. Primary and secondary reaction products are distinguished. The results are compared with those from earlier studies, and they suggest an explanation for an unusual ion concentration observed with laser-induced fluorescence by plasma diagnostics researchers. © 1990.