Besides crystallization time and temperature, the mass density change upon crystallization is a key parameter governing the reliability of phase change random access memory. Indeed, few percentages density change induces considerable mechanical stress in memory cells, leading to film delamination with subsequent electrical failures. This letter presents an extensive study of density change upon crystallization in a series of Ga-Sb thin films with various antimony contents. The mass density of the films is precisely determined by x-ray reflectivity in both their amorphous and crystalline states. The variations of the density in crystalline and amorphous films according to the Sb content found to cross with a zero-density change for 70 at. % Sb. The peculiar behavior of Ga-Sb thin films upon crystallization may be linked to their stress state and mechanical properties.