L.K. Wang, A. Acovic, et al.
MRS Spring Meeting 1993
In this paper we describe a novel method of eliminating charging during the high resolution SEM inspection and dimensional measurements of x-ray and optical masks. A soluble conducting polymer, polyaniline, is spin-coated on the mask and found to prevent charging even at 15 KV. This method is a non-destructive process in contrast to the commonly used technique of metal deposition, since the polymer can be cleanly removed without any damage to the mask. © 1991.
L.K. Wang, A. Acovic, et al.
MRS Spring Meeting 1993
J. Paraszczak, J.M. Shaw, et al.
Micro and Nano Engineering
A. Reisman, M. Berkenblit, et al.
JES
Daniel J. Coady, Amanda C. Engler, et al.
ACS Macro Letters