Paper
The DX centre
T.N. Morgan
Semiconductor Science and Technology
Hierarchical nanostructures are generated on substrates by combining a top-down ion beam lithography with a bottom-up self-assembly of block copolymers. The ion beam lithography images micron sized patterns of block copolymer thin films which contain nanometer sized microdomains. This approach provides a simple route to fabricate structures containing two different length scales, i.e. micrometers and nanometers, which may find a variety of potential applications in nanoscience and technology. © 2009 CPST.
T.N. Morgan
Semiconductor Science and Technology
William G. Van der Sluys, Alfred P. Sattelberger, et al.
Polyhedron
Shiyi Chen, Daniel Martínez, et al.
Physics of Fluids
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989