Hiroshi Ito, Reinhold Schwalm
JES
Hierarchical nanostructures are generated on substrates by combining a top-down ion beam lithography with a bottom-up self-assembly of block copolymers. The ion beam lithography images micron sized patterns of block copolymer thin films which contain nanometer sized microdomains. This approach provides a simple route to fabricate structures containing two different length scales, i.e. micrometers and nanometers, which may find a variety of potential applications in nanoscience and technology. © 2009 CPST.
Hiroshi Ito, Reinhold Schwalm
JES
Heinz Schmid, Hans Biebuyck, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
A. Nagarajan, S. Mukherjee, et al.
Journal of Applied Mechanics, Transactions ASME
Frank Stem
C R C Critical Reviews in Solid State Sciences