Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
We consider a 2-approximation algorithm for Euclidean minimum-cost perfect matching instances proposed by the authors in a previous paper. We present computational results for both random and real-world instances having between 1,000 and 131,072 vertices. The results indicate that our algorithm generates a matching within 2% of optimal in most cases. In over 1,400 experiments, the algorithm was never more than 4% from optimal. For the purposes of the study, we give a new implementation of the algorithm that uses linear space instead of quadratic space, and appears to run faster in practice. © 1996 INFORMS.
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Thomas R. Puzak, A. Hartstein, et al.
CF 2007
J.P. Locquet, J. Perret, et al.
SPIE Optical Science, Engineering, and Instrumentation 1998
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004