Dipanjan Gope, Albert E. Ruehli, et al.
IEEE T-MTT
We have developed a technique for both mastering and replicating data patterns for potential use in an atomic force microscope (AFM)-based data storage device. The process consists of using electron beam lithography to write data features as small as 50 nm and a photopolymerization process to faithfully replicate the written marks. The replicas can be read using a contact-mode AFM tip on a rotating disk, and no change in the signal is seen after 12 days of continuous reading. © 1997 American Vacuum Society.
Dipanjan Gope, Albert E. Ruehli, et al.
IEEE T-MTT
Mark W. Dowley
Solid State Communications
S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983
R.J. Gambino, N.R. Stemple, et al.
Journal of Physics and Chemistry of Solids