K.A. Chao
Physical Review B
We have developed a technique for both mastering and replicating data patterns for potential use in an atomic force microscope (AFM)-based data storage device. The process consists of using electron beam lithography to write data features as small as 50 nm and a photopolymerization process to faithfully replicate the written marks. The replicas can be read using a contact-mode AFM tip on a rotating disk, and no change in the signal is seen after 12 days of continuous reading. © 1997 American Vacuum Society.
K.A. Chao
Physical Review B
J.R. Thompson, Yang Ren Sun, et al.
Physica A: Statistical Mechanics and its Applications
F.J. Himpsel, T.A. Jung, et al.
Surface Review and Letters
S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999