A. Reisman, M. Berkenblit, et al.
JES
We have developed a technique for both mastering and replicating data patterns for potential use in an atomic force microscope (AFM)-based data storage device. The process consists of using electron beam lithography to write data features as small as 50 nm and a photopolymerization process to faithfully replicate the written marks. The replicas can be read using a contact-mode AFM tip on a rotating disk, and no change in the signal is seen after 12 days of continuous reading. © 1997 American Vacuum Society.
A. Reisman, M. Berkenblit, et al.
JES
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997
K.N. Tu
Materials Science and Engineering: A
Ronald Troutman
Synthetic Metals