Revanth Kodoru, Atanu Saha, et al.
arXiv
We have developed a technique for both mastering and replicating data patterns for potential use in an atomic force microscope (AFM)-based data storage device. The process consists of using electron beam lithography to write data features as small as 50 nm and a photopolymerization process to faithfully replicate the written marks. The replicas can be read using a contact-mode AFM tip on a rotating disk, and no change in the signal is seen after 12 days of continuous reading. © 1997 American Vacuum Society.
Revanth Kodoru, Atanu Saha, et al.
arXiv
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering
Kigook Song, Robert D. Miller, et al.
Macromolecules
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano