Biancun Xie, Madhavan Swaminathan, et al.
EMC 2011
We have developed a technique for both mastering and replicating data patterns for potential use in an atomic force microscope (AFM)-based data storage device. The process consists of using electron beam lithography to write data features as small as 50 nm and a photopolymerization process to faithfully replicate the written marks. The replicas can be read using a contact-mode AFM tip on a rotating disk, and no change in the signal is seen after 12 days of continuous reading. © 1997 American Vacuum Society.
Biancun Xie, Madhavan Swaminathan, et al.
EMC 2011
Shaoning Yao, Wei-Tsu Tseng, et al.
ADMETA 2011
Sharee J. McNab, Richard J. Blaikie
Materials Research Society Symposium - Proceedings
J.Z. Sun
Journal of Applied Physics