Julien Autebert, Aditya Kashyap, et al.
Langmuir
We have developed a technique for both mastering and replicating data patterns for potential use in an atomic force microscope (AFM)-based data storage device. The process consists of using electron beam lithography to write data features as small as 50 nm and a photopolymerization process to faithfully replicate the written marks. The replicas can be read using a contact-mode AFM tip on a rotating disk, and no change in the signal is seen after 12 days of continuous reading. © 1997 American Vacuum Society.
Julien Autebert, Aditya Kashyap, et al.
Langmuir
Zelek S. Herman, Robert F. Kirchner, et al.
Inorganic Chemistry
R.M. Macfarlane, R.L. Cone
Physical Review B - CMMP
B.A. Hutchins, T.N. Rhodin, et al.
Surface Science