Characterization and mechanism of He plasma pretreatment of nanoscale polymer masks for improved pattern transfer fidelity
- Florian Weilnboeck
- D. Metzler
- et al.
- 2011
- Applied Physics Letters
Publications
Patents
- 04 Mar 2024
- US
- 11923246
- 27 Nov 2023
- US
- 11830807
- 21 Nov 2023
- GB
- 2604485
- 06 Nov 2023
- US
- 11812668
- 02 Aug 2023
- DE
- 11 2020 003 993
- 26 Jun 2023
- US
- 11688636
- 01 Aug 2022
- US
- 11404317
- 14 Mar 2022
- US
- 11276607
- 07 Feb 2022
- US
- 11244907
- 17 Jan 2022
- US
- 11227892
Top collaborators
SE
Sebastian Engelmann
RSM, Quantum System Components Lead
NF
Nelson Felix
Director, Techinical Business Development - IBM Semiconductors
DW
Daniel Worledge
Distinguished Research Scientist and Senior Manager, MRAM