Properties of SiO2 Grown in the Presence of HCl or Cl2
- Y.J. van der Meulen
- C.M. Osburn
- et al.
- 2019
- JES
Paper
Publications
509 results at JES
On the Nature of CVD Si-Rich SiO2 and Si3N4 Films
- E.A. Irene
- N.J. Chou
- et al.
- 2019
- JES
PaperEpitaxial Relations in Films of Cr, Pt, and CrPt on Sapphire
- J.E.E. Baglin
- F.M. d'Heurle
- 2019
- JES
PaperOn Fitting Error Functions to Data
- R. Ghez
- M.B. Small
- 2019
- JES
PaperElectron Beam-Induced Reactions of Orthonaphthoquinone-Diazide-Sulfonyl Derivatives in Phenolic-Type Resins
- Hiroyuki Hiraoka
- Adolfo R. Gutierrez
- 2019
- JES
PaperThe Formation of SiO2 in an RF Generated Oxygen Plasma: II. The Pressure Range Above 10 mTorr
- A. Ray
- A. Reisman
- 2019
- JES
PaperResolution Limits Of PMMA Resist for Exposure with 50 kV Electrons
- Alec N. Broers
- 2019
- JES
PaperLuminescence of Silica Glasses Containing Copper
- J.M. Brownlow
- I.F. Chang
- 2019
- JES
PaperThe Formation of SiO2 in an RF Generated Oxygen Plasma: I. The Pressure Range Below 10 mTorr
- A. Ray
- A. Reisman
- 2019
- JES
PaperAn electron microscope investigation of the effect of phosphorous doping on the plasma etching of polycrystalline silicon
- E.A. Irene
- E. Tierney
- et al.
- 2019
- JES
Paper