Improved Dielectric Reliability of SiO2 Films with Polycrystalline Silicon Electrodes
- C.M. Osburn
- E. Bassous
- 2019
- JES
Publications
509 results at JES
The Formation of SiO2 in an RF Generated Oxygen Plasma: II. The Pressure Range Above 10 mTorr
- A. Ray
- A. Reisman
- 2019
- JES
Epitaxial Relations in Films of Cr, Pt, and CrPt on Sapphire
- J.E.E. Baglin
- F.M. d'Heurle
- 2019
- JES
On Fitting Error Functions to Data
- R. Ghez
- M.B. Small
- 2019
- JES
Electron Beam-Induced Reactions of Orthonaphthoquinone-Diazide-Sulfonyl Derivatives in Phenolic-Type Resins
- Hiroyuki Hiraoka
- Adolfo R. Gutierrez
- 2019
- JES
The Fabrication of High Precision Nozzles by the Anisotropic Etching of (100) Silicon
- E. Bassous
- E.F. Baran
- 2019
- JES
Plasma Oxide FET Devices
- A. Ray
- A. Reisman
- 2019
- JES
Resolution Limits Of PMMA Resist for Exposure with 50 kV Electrons
- Alec N. Broers
- 2019
- JES
Titanium Dioxide Films to Improve Photoresist Adhesion
- John C. Marinace
- Ralph C. McGibbon
- 2019
- JES
Anomalous Etch Structures Using Ethylenediamine-Pyrocatechol-Water Based Etchants and Their Elimination
- A. Reisman
- M. Berkenblit
- et al.
- 2019
- JES