Poly(Methyl Methacrylate-isobutylene) Copolymers as Highly Sensitive Electron Beam ResistsEdward GipsteinWayne Moreauet al.2019JES
Selective Studies of Chemical Vapor-Deposited Aluminum Nitride-Silicon Nitride Mixture FilmsS. ZirinskyE.A. Irene2019JES
Direct Evidence for 1 nm Pores in “Dry” Thermal SiO2 from High Resolution Transmission Electron MicroscopyJ.M. GibsonD.W. Dong2019JES
Influence of the Growth Conditions of Al2O3 Passivating Layers on the Corrosion of Aluminum Films in WaterJ. GrimblotJ.M. Eldridge2019JES
Preparation and Some Properties of Chemically Vapor-Deposited Si-Rich SiO and Si3N4 FilmsD.W. DongE.A. Ireneet al.2019JES
Copolymers of Methyl Methacrylate and Methacrylic Acid and Their Metal Salts as Radiation Sensitive ResistsIvan HallerRalph Federet al.2019JES
Al Coverage of Surface Steps at SiO2 Insulated Polycrystalline Si Boundaries: Al Evaporation in Vacuum and Low Pressure ArV.J. SilvestriV.L. Rideoutet al.2019JES