An experimental high-density memory array fabricated with electron beam
- H.N. Yu
- R.H. Dennard
- et al.
- 1973
- ISSCC 1973
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38 results for M. Hatzakis
1 µm MOSFET VLSI Technology: Part VI― Electron-Beam Lithography
- Warren D. Grobman
- Hans E. Luhn
- et al.
- 1979
- IEEE JSSC
Chemistry of hexamethylcyclotrisilazane (HMCTS) silylation
- K.J. Stewart
- J.M. Shaw
- et al.
- 1989
- Symposium on Patterning Science and Technology 1989
Chemical and physical aspects of multilayer resist processing
- J. Paraszczak
- E. Babich
- et al.
- 1989
- Proceedings of SPIE 1989
Epoxy resins for deep UV lithography
- K.J. Stewart
- M. Hatzakis
- et al.
- 1988
- SPE Regional Technical Conference 1988
POLYSILOXANE RESIST AS A PROBE FOR ENERGY DEPOSITED IN ELECTRON BEAM EXPOSED RESISTS.
- D. Kern
- J. Paraszczak
- et al.
- 1982
- Microcircuit Engineering 1982
Multilayer resist systems using polysiloxanes as etch masks
- J. Paraszczak
- J.M. Shaw
- et al.
- 1983
- Microlithography 1983
Developer Temperature Effects on E-Beam and Optically Exposed Positive Photoresist
- J.M. Shaw
- M. Hatzakis
- 2019
- JES
Copolymers of Methyl Methacrylate and Methacrylic Acid and Their Metal Salts as Radiation Sensitive Resists
- Ivan Haller
- Ralph Feder
- et al.
- 2019
- JES
Organosilicon polymers for lithographic applications
- Michael Hatzakis
- 2011
- Makromolekulare Chemie. Macromolecular Symposia